AN ELECTRON BEAM CURING APPARATUS

摘要

An electron beam curing apparatus is provided to cure simultaneously an entire area of a photoresist layer on a wafer by arranging a plurality of tips at a predetermined interval on a semiconductor substrate. A plurality of tips(120) are projected from a lower side of a semiconductor substrate(110) in order to emit electron beams for providing on a wafer on which a photoresist layer is formed. An extractor electrode(140) is used for accelerating the electron beams emitted from the tips. An anode electrode(160) is used for focusing the accelerated electron beams. An aperture plate(180) includes a plurality of apertures through which the electron beams pass. A plurality of deflectors(200) are used for deflecting the electron beams.