EXHAUST APPARATUS OF SEMICONDUCTOR MANUFACTURING EQUIPMENT

摘要

An exhaust apparatus of semiconductor manufacturing equipment is provided to capture residual gas and impurities from a trap by using a cooling jacket installed on an outer surface of the trap. An exhaust line(110) is connected with one side of a process chamber in order to exhaust residual gas from the inside of the process chamber. A trap(120) is installed on the exhaust line. A cooling jacket(140) is closely attached on an outer surface of the trap. A cooling jacket is installed in the inside of the cooling jacket. One end of the cooling line is connected through a cooling water supply unit to a cooling water supply line. The other end of the cooling line is connected through a cooling water draining line.