MASKS, LITHOGRAPHY DEVICE AND SEMICONDUCTOR COMPONENT

摘要

The invention relates to masks comprising a multilayer coating of a specified period thickness distribution such as those used in lithography devices for producing semiconductor components. One problem of projection optics concerns pupil apodization which leads to imaging defects. The invention provides that the period thickness in the mask plane is selected so that it is greater than the period thickness ideal for maximum reflectivity. As a result, not only does the apodization over the pupil become more symmetric but the intensity variation also becomes smaller overall.