发明名称 HEAT TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a heat treatment apparatus where in-plane uniformity of temperature distribution can be improved for an outer peripheral side part from a center part of a heat treatment plate. SOLUTION: The heat treatment apparatus is provided with: the heat treatment plate 11 in which a substrate W is brought close to or is placed on a surface and which heat-treats the substrate; five cooling means 30 to 30e arranged at the rear of the heat treatment plate 11; temperature sensors 14 to 14e for measuring a temperature of the heat treatment plate 11; side part heating heaters 18 to 18i which are divisionally arranged in four regions of the outer peripheral side of the heat treatment plate 11; and side part cooling means 30f to 30i which are divisionally disposed in four regions on an outer periphery of the side part heating heater 18. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006324335(A) 申请公布日期 2006.11.30
申请号 JP20050144239 申请日期 2005.05.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HISAI AKIHIRO;GOTO SHIGEHIRO
分类号 H01L21/027;F25D1/00;F25D1/02;F28D15/02 主分类号 H01L21/027
代理机构 代理人
主权项
地址