发明名称 |
HEAT TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus where in-plane uniformity of temperature distribution can be improved for an outer peripheral side part from a center part of a heat treatment plate. SOLUTION: The heat treatment apparatus is provided with: the heat treatment plate 11 in which a substrate W is brought close to or is placed on a surface and which heat-treats the substrate; five cooling means 30 to 30e arranged at the rear of the heat treatment plate 11; temperature sensors 14 to 14e for measuring a temperature of the heat treatment plate 11; side part heating heaters 18 to 18i which are divisionally arranged in four regions of the outer peripheral side of the heat treatment plate 11; and side part cooling means 30f to 30i which are divisionally disposed in four regions on an outer periphery of the side part heating heater 18. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2006324335(A) |
申请公布日期 |
2006.11.30 |
申请号 |
JP20050144239 |
申请日期 |
2005.05.17 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
HISAI AKIHIRO;GOTO SHIGEHIRO |
分类号 |
H01L21/027;F25D1/00;F25D1/02;F28D15/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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