| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an apparatus for forming a photo mask, which has a carrying arm composed of: an arm for carrying a transparent substrate to be treated for manufacturing the photo mask into a stage in the manufacturing treating apparatus, or carrying it out to a stage outside the apparatus; and a mount to contact with the transparent substrate projecting to the top end of the arm, and also to provide a method of ensuring a uniformity of the temperature distribution of the transparent substrate in the substrate plane before a resist coating process of the substrate carried by the carrying arm or a resist developing process, and a manufacturing apparatus. <P>SOLUTION: The photo mask manufacturing apparatus having a carrying arm having a structure allowing the mount to be removably mounted on the arm comprises a heater having a means for heating the mount only for controlling the temperature of the mount directly contacted with a transparent substrate, or a cooler having a cooling means. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
