发明名称 |
Wasserstoff- oder Helium-Permeationsmembran und Speichermembran und Verfahren zur Herstellung derselben |
摘要 |
<p>A hydrogen permeation membrane that selectively allows the passage of hydrogen and that can be formed in a desired shape is obtained by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium permeation membrane that has excellent water resistance. Similarly, a hydrogen or helium storage membrane that selectively stores hydrogen and that can be formed in a desired shape can be formed by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium storage membrane that has excellent water resistance.</p> |
申请公布号 |
DE112005000200(T5) |
申请公布日期 |
2006.11.30 |
申请号 |
DE20051100200 |
申请日期 |
2005.01.04 |
申请人 |
SFC CO. LTD. |
发明人 |
IKEDA, SHINICHI;UMEYAMA, NORIO;OGASAWARA, ARIYOSHI;ABE, HIDEO;TANAKA, YASUHITO |
分类号 |
B01D71/70;B01D53/22;B01D67/00;B01D69/14;B01J20/26;B01J20/28;C01B3/00;C01B3/50;C01B23/00 |
主分类号 |
B01D71/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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