发明名称 Wasserstoff- oder Helium-Permeationsmembran und Speichermembran und Verfahren zur Herstellung derselben
摘要 <p>A hydrogen permeation membrane that selectively allows the passage of hydrogen and that can be formed in a desired shape is obtained by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium permeation membrane that has excellent water resistance. Similarly, a hydrogen or helium storage membrane that selectively stores hydrogen and that can be formed in a desired shape can be formed by using a silicon resin that includes at least phenylheptamethylcyclotetrasiloxane and/or 2,6-cis-diphenylhexamethylcyclotetrasiloxane. A heat-resistant coating that is resistance to temperature of 300° C. or higher is obtained in a sintering process at temperature of 200° C. to 500° C., thereby providing a hydrogen or helium storage membrane that has excellent water resistance.</p>
申请公布号 DE112005000200(T5) 申请公布日期 2006.11.30
申请号 DE20051100200 申请日期 2005.01.04
申请人 SFC CO. LTD. 发明人 IKEDA, SHINICHI;UMEYAMA, NORIO;OGASAWARA, ARIYOSHI;ABE, HIDEO;TANAKA, YASUHITO
分类号 B01D71/70;B01D53/22;B01D67/00;B01D69/14;B01J20/26;B01J20/28;C01B3/00;C01B3/50;C01B23/00 主分类号 B01D71/70
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