| 发明名称 |
METHOD FOR PRODUCING POTASSIUM NIOBATE DEPOSIT, POTASSIUM NIOBATE LAYER, SURFACE ACOUSTIC WAVE DEVICE AND ITS MANUFACTURING METHOD, AND ELECTRONIC EQUIPMENT |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a potassium niobate deposit including a thin film of potassium niobate layer. <P>SOLUTION: This method for producing the potassium niobate deposit 100 comprises a step of forming a potassium niobate layer 13 on or above the substrate 11 and a step of heat treating at least the potassium niobate layer 13 under pressure lower than atmospheric pressure. <P>COPYRIGHT: (C)2007,JPO&INPIT |
| 申请公布号 |
JP2006321676(A) |
申请公布日期 |
2006.11.30 |
| 申请号 |
JP20050145640 |
申请日期 |
2005.05.18 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
HIGUCHI AMAMITSU |
| 分类号 |
C01G33/00;C23C14/58;H01L41/09;H01L41/18;H01L41/187;H01L41/22;H01L41/316;H01L41/43;H03H3/08 |
主分类号 |
C01G33/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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