| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask with which the undercut amount of a lower layer film is accurately evaluated in forming a lift-off mask. <P>SOLUTION: The photomask for evaluation of etching in forming the lift-off mask having a lower layer film 2 composed of a non-photosensitive material which can be etched and an upper layer film 3 composed of a positive type photoresist, is equipped with a plurality of non-transmissive parts 13 which have been formed mutually independently and with spacings between them, wherein the spacings between the non-transmissive parts 13 are made transmissive parts 14, and at least two out of the non-transmissive parts 13 have been formed to have widths different from each other, and the spacing between the adjacent non-transmissive parts 13 are made equal to one another. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
