发明名称 MANUFACTURING METHOD OF SEMICONDUCTOR LENS
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor lens manufacturing method capable of easily manufacturing the semiconductor lens having an optional shape and also having a smooth surface. SOLUTION: Regarding the silicon lens 1 (Fig.1(e)) manufacturing method for manufacturing the silicon lens 1 as the semiconductor lens by partly removing a p-type silicon substrate 10 (Fig.1(a)) as a semiconductor substrate, the method comprises; an anode forming step of forming an anode 12 (Fig.1(c)) which is pattern-designed in accordance with a desired lens shape on one surface side of the p-type silicon substrate 1; an anodic oxidation step of forming a porous part 14 (Fig.1(d)) as a part to be removed, made of porous silicon, on the other surface side of the p-type silicon substrate 10 by energizing between a cathode oppositely arranged on the other surface side of the p-type silicon substrate 10 and the anode 12 in electrolytic solution; and a porous part removing step of removing the porous part 14. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006323353(A) 申请公布日期 2006.11.30
申请号 JP20060018196 申请日期 2006.01.26
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 HONDA YOSHIAKI;NISHIKAWA NAOYUKI
分类号 G02B3/00;G02B1/02 主分类号 G02B3/00
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