| 摘要 |
PROBLEM TO BE SOLVED: To deposit a thin film comprising functional particulates on the surface of a base material in a stable state. SOLUTION: In the method for depositing a functional film, functional particulates 38 are mixed into a gas for film deposition for performing film deposition by plasma CVD, and the gas for film deposition is introduced into a reaction vessel 10, so as to perform CVD. Thus, a functional film comprising the functional particulates 38 is deposited on the surface of a base material 14. COPYRIGHT: (C)2007,JPO&INPIT
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