发明名称 Photosensitive resin composition and photosensitive films and laminates made by using the same
摘要 A photosensitive resin composition of the present invention contains a (A) soluble polyimide and a (b) (meth)acrylic compound, the (A) soluble polyimide being soluble in an organic solvent and being synthesized by using an acid dianhydride component and at least one of a diamine component containing a siloxane structure or an aromatic ring structure, and a diamine component having, in its structure, a hydroxyl group a carboxyl group or a carbonyl group, and the (B) (meth)acrylic compound having at least one carbon-carbon double bond, and preferably contains at least one of a (C) photo reaction initiator and a (D) fire retardant. With this arrangement, the photosensitive resin composition of the present invention is capable of having excellent properties. Especially, the photosensitive resin composition of the present invention is so excellently useful that it can be used for electronic parts and the like.
申请公布号 US7141614(B2) 申请公布日期 2006.11.28
申请号 US20040493364 申请日期 2004.04.23
申请人 KANEKA CORPORATION 发明人 OKADA KOJI;TAKAGAHARA KAORU;YAMANAKA TOSHIO
分类号 C08F2/46;B32B15/08;B32B27/28;C08G73/10;C08L79/08;C08L83/04;G03C1/73;G03F7/027;G03F7/037;G03F7/038;G03F7/075 主分类号 C08F2/46
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