| 发明名称 |
Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby |
| 摘要 |
Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.
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| 申请公布号 |
US7141340(B2) |
申请公布日期 |
2006.11.28 |
| 申请号 |
US20030721789 |
申请日期 |
2003.11.26 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER ARNO JAN |
| 分类号 |
G02F1/03;G03F1/00;G03B27/42;G03F1/14;G03F7/20;G09G3/04;H01L21/027 |
主分类号 |
G02F1/03 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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