| 摘要 |
CVD(Chemical Vapor Deposition) method and apparatus are provided to prevent various reaction gases from being mixed with each other by supplying discretely the various reaction gases to an aiming portion using compartments and reaction/anti-reaction gas outlets of a shower head. A shower head(100) is arranged over a substrate. A variety of reaction gases are filled in first compartments of the shower head, respectively. An anti-reaction gas is filled in second compartments of the shower head. The variety of reaction gases are sprayed from reaction gas outlets of the shower head. At this time, the anti-reaction gas is sprayed from anti-reaction gas outlets of the shower head. The number of the anti-reaction gas outlets is larger than that of the reaction gas outlets.
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