| 摘要 |
<p>Provided is an exposure apparatus for exposing a substrate by irradiating exposure light on the substrate through a projection optical system and liquid, where the exposure apparatus has a detection device for detecting whether or not the liquid is present on an object placed below the forward end of the projection optical system. Also provided is a detection device having an emission section for emitting detection light to a liquid immersion region formed between a projection optical system and an object placed on the image surface side of the system and having a light reception section placed at a predetermined position relative to the detection light, and obtaining at least either the size or shape of the liquid immersion region based on the result of light reception by the light reception section. The detection devices detect whether or not liquid is present on an object placed below the forward end of the projection optical system or detect the shape of liquid and a contact angle, and based on the result detected, optimum treatment is performed to maintain high exposure accuracy and measurement accuracy.</p> |
