METHOD AND APPARATUS FOR TREATING GAS CONTAINING FLUORINE COMPOUND

摘要

PROBLEM TO BE SOLVED: To remove fluorine compounds from a gas containing silicon compounds and fluorine compounds with a high decomposition rate by the use of a fluorine compound decomposition catalyst.

SOLUTION: A gas to-be-treated containing fluorine compounds and silicon compounds is wet-treated with water or an aqueous solution to dissolve and remove most of the silicon compounds. Since part of the silicon compounds are entrained with the gas in mist form and discharged, the silicon compounds are removed before treatment with a fluorine compound decomposition catalyst. They are typically removed by absorption decomposition with a basic oxide or hydrolytic decomposition removal with a capturing material based on activated alumina. The gas after removal of silicon compounds is passed through a fluorine compound decomposition catalyst to decompose the fluorine compounds. The method enables control of catalyst poisoning by silicon compounds and retention of the decomposition performance of the catalyst for fluorine compounds.

COPYRIGHT: (C)2007,JPO&INPIT