发明名称 INLINE ELECTRON BEAM INSPECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To disclose a method and a system for inspecting a plurality of electronic devices formed on a large-area substrate. SOLUTION: In this system of one example of implementation, inspections is performed on the substrate along one linear axis in at least one chamber, slightly wider than the size of the substrate to be inspected. The space of a clean room and a processing time period are minimized by the smaller size and capacity of the system. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006317437(A) 申请公布日期 2006.11.24
申请号 JP20060125815 申请日期 2006.04.28
申请人 APPLIED MATERIALS INC 发明人 ABBOUD FAYEZ E;KRISHNASWAMI SRIRAM;JOHNSTON BENJAMIN M;NGUYEN HUNG T;BRUNNER MATTHIAS;SCHMITT RALF;WHITE JOHN M;KURITA SHINICHI;HUNTER JAMES C
分类号 G01N23/225;G01N21/88 主分类号 G01N23/225
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