发明名称 INSPECTION METHOD FOR SEMICONDUCTOR DEVICE
摘要 An inspection method for a semiconductor device is provided to exactly detect whether a landing plug is electrically connected to an active region of a substrate or not by using a detector. A landing plug(205) made of a first conductive layer is formed to connect an active region of a substrate(201). An interlayer dielectric(210) is formed on the resultant structure and selectively etched to expose the landing plug, thereby forming a via hole. A second conductive layer(220) having a relatively high conductivity compared to the first conductive layer is filled in the via hole. Electron beam(130) is scanned to the surface of the resultant structure. A detector(140) detects a relative value of the contact voltage and displays to an image display.
申请公布号 KR20060119189(A) 申请公布日期 2006.11.24
申请号 KR20050041818 申请日期 2005.05.18
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JIE, SEOK HO;LEE, JONG PIL
分类号 H01L21/66 主分类号 H01L21/66
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