发明名称 LITHOGRAPHIC PROJECTION APPARATUS AND METHOD FOR MANUFACTURING DEVICE USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a means for preventing collisions between tables, even if unexpected situations, such as a control software error and a power supply failure, occur, when the tables are exchanged between different working zones, in a lithographic apparatus which has a plurality of the tables in which a mask or a substrate is mounted. <P>SOLUTION: In the collision prevention means, physical hazard objects 190, 170, 180 and 200 are provided labyrinthically along a path in which substrate tables WTa and WTb are moved from a working zone 20 to a working zone 30 or vice versa so that only correct path can be passed through. In the exchange process, the tables are combined with shuttles CS1 and CS2, respectively, and these shuttles are linked by a chain and the like so that both tables can only be moved together, thereby preventing collisions. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006319366(A) 申请公布日期 2006.11.24
申请号 JP20060199106 申请日期 2006.07.21
申请人 ASM LITHOGRAPHY BV 发明人 KWAN YIM BUN PATRICK;VAN DE PASCH ENGELBERTUS A F;ARIENS ANDREAS BERNARDUS GERARDUS;MUNNIG SCHMID ROBERT-HAN;HOOGKAMP JAN F;BUIS EDWIN JOHAN
分类号 G03F7/22;H01L21/027;G03F7/20;G03F9/00 主分类号 G03F7/22
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