| 摘要 |
A deposition apparatus is provided to obtain an optimal deposition speed by effectively discharging material vapor out of the deposition apparatus. A deposition apparatus includes a chamber and a revolver. A deposition film forming process is performed in the chamber. Plural deposition sources are positioned in the revolver. The deposition apparatus includes a main body(21) and a cured material removing unit(200). The main body is implemented on an outer surface of the revolver, such that the main body horizontally moves along the outer surface of the revolver. The cured material removing unit includes an arm, which is implemented on the main body and vertically moved. The arm also rotates of itself. The deposition apparatus includes a sensor(C) and a controller.
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