| 摘要 |
<p>Organic anti-reflective coating composition containing novolac resin, cross-linkage polymer, hot acid generator and organic solvent is provided to prevent collapse of photoresist pattern without requiring alternative hard-mask, and damage of base layer caused by etching during patterning process by selecting the novolac resin with weight average molecular weight ranging from 2000 to 100000. The coating composition comprises: novolac resin having weight average molecular weight of 2000 to 100000; cross-linkable polymer; hot acid generator; and organic solvent, wherein the cross-linkable polymer is represented by formula(1), where R1 and R2 are independently branched or straight chain-substituted alkyl group having C1 to C10, R3 is hydrogen or methyl group, and a and b are molar rates of monomers, a ranges from 0.9 to 0.99 while b ranges from 0.01 to 0.1. The hot acid generator is especially 2-hydroxy cyclohexyl para-toluene sulfonate with specific structure. Amounts of the novolac resin range from 50 to 200 parts by weight, and amounts of the hot acid generator range from 10 to 200 parts by weight relative to 100 parts by weight of the cross-likable polymer.</p> |
