| 摘要 |
An etching apparatus for semiconductor device manufacturing is provided to prevent the damage of a chain structure by counting the number of up/down movement of a body using a counter sensor. An etching apparatus for semiconductor device manufacturing includes a chamber, a chuck, a body, and a counter sensor. The chamber(110) is used for treating a semiconductor substrate. The pressure of the chamber is capable of being controlled. The chuck is installed in the chamber to load stably the substrate. The body(140) is used for supporting the chuck. The body is capable of moving up and down. The counter sensor(180a,180b) is capable of counting the number of up/down movement of the body.
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