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发明名称
EXHAUST SYSTEM USED IN MANUFACTURING SEMICONDUCTOR DEVICES AND APPARATUS FOR TREATING SUBSTRATES USING THE SYSTEM
摘要
申请公布号
KR100648268(B1)
申请公布日期
2006.11.23
申请号
KR20040080087
申请日期
2004.10.07
申请人
发明人
分类号
H01L21/02;H01L21/205
主分类号
H01L21/02
代理机构
代理人
主权项
地址
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