发明名称 |
Nitride-based compound semiconductor, method of cleaning a compound semiconductor, method of producing the same, and substrate |
摘要 |
<p>There is provided a cleaning method and production method that suppresses the adhesion of foreign matters including impurity, fine particles and the like on a surface of a compound semiconductor. A method of cleaning a nitride-based compound semiconductor in accordance with the present invention includes the steps of: preparing a nitride-based compound semiconductor (or a substrate preparation step (S10)); and cleaning (S20). In the step of cleaning (S20), a cleaning liquid having a pH of 7.1 or higher is used to clean the nitride-based compound semiconductor.</p> |
申请公布号 |
EP1724821(A2) |
申请公布日期 |
2006.11.22 |
申请号 |
EP20060010084 |
申请日期 |
2006.05.16 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
HACHIGO, AKIHIRO;NISHIURA, TAKAYUKI |
分类号 |
H01L21/306;H01L21/304 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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