| 摘要 |
A SAM is formed on a photo mask by providing the photo mask, preparing a solution of a reactant in a suitable solvent, and applying the solution of the reactant to the surface of the photo mask to form an organic SAM. The photo mask has a transparent substrate and a mask pattern. The reactant has an organic chain and an active head. In a further refinement, the organic SAM can be oxidized, such that an inorganic film is formed from the active head, and the organic chain is removed. The solution may be prepared, e.g., using a reactive silane head as the reactant species. The inorganic film includes SiO<SUB>2</SUB>. |
