| 摘要 |
PROBLEM TO BE SOLVED: To accurately detect film thickness irregularity, concerning a technology for inspecting the film thickness irregularity of a film formed on an object. SOLUTION: This irregularity inspection device 1 is equipped with a stage 2 for holding a substrate 9, a light emission part 3 for emitting linear light toward the upper surface 91 where a film 92 of the substrate 9 is formed, a light reception part 4 for receiving reflected light from the substrate 9, a wavelength band switching mechanism 5 for switching the wavelength band of light received by the light reception part 4, a polarizer 6 arranged on an optical path from the substrate 9 to the wavelength band switching mechanism 5 and transmitting selectively S-polarized light in reflected light from the film 92, a moving mechanism 21 for moving the stage 2, and an inspection part 7 for inspecting the film thickness irregularity based on an intensity distribution of the received light. Since fluctuation of the reflectivity to the S-polarized light is larger, compared with fluctuation of the reflectivity to non-polarized light or P-polarized light, the film thickness irregularity can be detected accurately by improving sensitivity to the film thickness irregularity of a line sensor 41, by changing the light received by the light reception part 4 into the S-polarized light by the polarizer 6 in the irregularity inspection device 1. COPYRIGHT: (C)2007,JPO&INPIT
|
