Method for depositing coating systems

摘要

An aluminum, zirconium and nitrogen based layer system includes a layer which exhibits covalent bonding of aluminum nitride or of aluminum nitride and zirconium nitride. An Independent claim is also included for deposition of the above layer system by: (a) igniting an electrical gas discharge in a vacuum chamber to form a noble gas-enriched plasma for ionization of the aluminum and/or zirconium; and (b) forming aluminum and/or zirconium nitride at a controlled reactive gas partial pressure by continuously nitrogen supply and removal. Preferred Features: The layer has an Al/Zr atomic ratio of≤1 and is≥50 mu thick. Deposition is carried out using separate aluminum and zirconium targets or an aluminum-zirconium alloy target, optionally together with one or more group Ib-IVb and/or IVa-VIa element targets.