NANO-PATTERN MOLD FOR WIRE GRID POLARIZERS AND METHOD FOR FORMING THEREOF

摘要

A nano pattern mold for a wire grid polarizer and a forming method thereof are provided to obtain uniform nano patterns from the mold in spite of a large size, to improve a manufacturing rate and to reduce fabrication costs. A first insulating layer(20) is formed on a substrate(10). A silicon layer and a second insulating layer are sequentially formed on a first insulating layer. A photoresist pattern with a predetermined cycle of T is formed on the second insulating layer. The second insulating layer and the silicon layer are sequentially etched by using the photoresist pattern as an etch mask. The photoresist pattern is removed therefrom. An oxide pattern(60) is formed on the resultant structure by oxidizing a sidewall of the silicon layer. The second insulating layer and the silicon layer are then removed from the resultant structure.