Method for removing the polymer residue in the metal line of semiconductor device,申请号KR20040114633-传众专利搜索

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发明名称	Method for removing the polymer residue in the metal line of semiconductor device
摘要
申请公布号	KR100644055(B1)	申请公布日期	2006.11.10
申请号	KR20040114633	申请日期	2004.12.29
申请人		发明人
分类号	H01L21/304;H01L21/28	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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