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发明名称
Method of chemical mechanical polishing in a semiconductor device
摘要
申请公布号
KR100645172(B1)
申请公布日期
2006.11.10
申请号
KR20040048240
申请日期
2004.06.25
申请人
发明人
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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