发明名称 Lithographic apparatus and device manufacturing method
摘要 A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as cyclooctane, decalin, bicyclohexyl, exo-tetrahydro-dicyclopentadiene and cyclohexane, another high-index hydrocarbon, a perfluoropolyether, such as perfluoro-N-methylmorpholine and perfluoro E2, a perfluoroalkane, such as perfluorohexane, or a hydrofluoroether; and water, respectively.
申请公布号 US2006250591(A1) 申请公布日期 2006.11.09
申请号 US20050120198 申请日期 2005.05.03
申请人 ASML NETHERLANDS B.V. 发明人 STRAAIJER ALEXANDER
分类号 G03B27/42 主分类号 G03B27/42
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