| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition mask for forming an electrode film having a region whose circumference is perfectly closed by the electrode and where the electrode film is not formed is formed at the inside of the film face. SOLUTION: In the mask for vapor deposition, a first mask part constituting the outside profile part of a mask pattern and a second mask part constituting the inside profile part of the mask pattern are connected by at least one bridge part which is thinner than the first mask part and the second mask part and which connects them in a form of forming a gap on a space with the surface of the work, when the mask is arranged on the surface of a work. COPYRIGHT: (C)2007,JPO&INPIT
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