发明名称 |
INSPECTION APPARATUS AND INSPECTION METHOD USING ELECTRON BEAM |
摘要 |
A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
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申请公布号 |
US2006251318(A1) |
申请公布日期 |
2006.11.09 |
申请号 |
US20060379463 |
申请日期 |
2006.04.20 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
GUNJI YASUHIRO;MIYAI HIROSHI;TANAKA SHIGEYA |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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