发明名称 INSPECTION APPARATUS AND INSPECTION METHOD USING ELECTRON BEAM
摘要 A visual inspection apparatus and method using the scanning electron microscope are disclosed. An electron beam is scanned repeatedly on a sample, and an inspection and a reference image are generated by the secondary electrons generated from the sample or reflected electrons. From the differential image between the inspection image and the reference image, a defect is determined. The number of pixels in the generated image along the direction of repetitive scanning by the electron beam can be changed.
申请公布号 US2006251318(A1) 申请公布日期 2006.11.09
申请号 US20060379463 申请日期 2006.04.20
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 GUNJI YASUHIRO;MIYAI HIROSHI;TANAKA SHIGEYA
分类号 G06K9/00 主分类号 G06K9/00
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