发明名称 LIGHT PATTERNING DEVICE USING TILTING MIRROR IN SUPERPIXEL FORM
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical patterning device and its method that improves luminance and phase modulation characteristics of an individually controllable element array. <P>SOLUTION: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength &lambda;. An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other, and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006309243(A) 申请公布日期 2006.11.09
申请号 JP20060123340 申请日期 2006.04.27
申请人 ASML HOLDINGS NV;ASML NETHERLANDS BV 发明人 BABA-ALI NABILA;BLEEKER ARNO JAN;TROOST KARS ZEGER
分类号 G02B26/08;B81B3/00;B81B7/04;G03F7/20;H01L21/027;H04N1/113 主分类号 G02B26/08
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