| 发明名称 |
The use of the top coat composition in an immersion lithography |
| 摘要 |
<p>The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.</p> |
| 申请公布号 |
EP1720067(A1) |
申请公布日期 |
2006.11.08 |
| 申请号 |
EP20050727061 |
申请日期 |
2005.03.22 |
| 申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
MAEDA, KAZUHIKO;KOMORIYA, HARUHIKO;SUMIDA, SHINICHI;MIYAZAWA, SATORU;OOTANI, MICHITAKA |
| 分类号 |
G03F7/11;C08K3/00;C09J133/14;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
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