发明名称 IMAGE EXPOSURE SYSTEM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an image exposure system which can eliminate the influence of tailing in a sub-scanning direction and suppress the variation of data when an image is formed by using a liquid crystal shutter. <P>SOLUTION: This image exposure system comprises: a light source; the liquid crystal shutter 21 which is arranged on the optical-axis-direction front side of the light source, which can control the transmission/shielding of exposure light, and which is composed of a pixel group arranged along a main-scanning direction and a pixel group arranged along a sub-scanning direction; a cylindrical lens 22 which is arranged ahead of the liquid crystal shutter 21 so as to make the exposure light form the image on a photographic sensitive material; a pixel data splitting means 4c for splitting pixel data, equivalent to one pixel, depending on the number of the pixels of the pixel group arranged in the sub-scanning direction, and turning the split pixel data into a histogram; and a shutter control means 6a for controlling each of the pixels constituting the liquid crystal shutter 21, depending on the value of the split pixel data. In the performance of the exposure equivalent to one pixel, after the light applied from the light source is transmitted through the pixel group which is arranged along the sub-scanning direction, the lens 22 makes the light converge into the exposure light with a size equivalent to one pixel. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2006297792(A) 申请公布日期 2006.11.02
申请号 JP20050123888 申请日期 2005.04.21
申请人 NORITSU KOKI CO LTD 发明人 HIROOKA ATSUSHI;YOSHIDA KAZUHIRO;NISHIHARA TAKESHI;OKI YOZO;MORIKAWA SATOSHI
分类号 B41J2/445;G03B27/32;G03B27/72 主分类号 B41J2/445
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