| 摘要 |
<p>A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is placed and movable while holding the substrate, a position measuring system (18 and others) for measuring positional information of the substrate table, and a correcting apparatus (19) for correcting positional displacement occurring in at least either the substrate or the substrate table caused by supply of a liquid. The correcting apparatus corrects positional displacement occurring in at least either the substrate or the substrate table caused by supply of a liquid. By the structure above, a substrate is highly accurate exposed using a liquid immersion method.</p> |
