| 摘要 |
PROBLEM TO BE SOLVED: To properly carry out heat treatment of a substrate by reducing a temperature difference within the heated substrate in a circulating type kiln passing gas heated by a heating apparatus through a treatment part housing the substrate while circulating the gas by a circulating fan to carry out heat treatment of the substrate. SOLUTION: In the circulating type kiln, the gas heated by the heat apparatus 14 is passed through the treatment part 12 housing the substrate 20 while circulating the gas by the circulating fan 16 to carry out heat treatment of the substrate 20, the heating apparatus 14 is provided in a neighborhood of the substrate 20 in a gas flow direction downflow side with respect to the substrate 20. COPYRIGHT: (C)2007,JPO&INPIT
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