发明名称 METHOD OF MANUFACTURING DIAMOND ELECTRODE AND STRUCTURE OF ELECTRODE
摘要 PROBLEM TO BE SOLVED: To solve the problem that a diamond film on the peeling-off and the wear of a diamond electrode occur by the causes that diamond has thermal expansion coefficient remarkably smaller than that of a substrate to leave excessive thermal stress remains on the diamond film, the sure adhesion of the film to the substrate is hardly attained, a good quality film is not applied homogeneously on a large-scaled electrode or the like though the diammond electrode coated with the conductive diamond film is expected to be applied on wide fields such as a water treatment because of the wide electrochemical potential window. SOLUTION: In the method of manufacturing the electrode, after being applied on the substrate by a low pressure vapor phase synthesis, the diamond film is once separated from the substrate and is applied on another substrate with a conductive adhesive. As a result, thermal stress is removed, the most suitable material for the substrate and an electrode plate is individually selected, the high quality and homogeneous film is applied even on a large surface area and then, the adhesion of the diamond film is firm and sure to reduce the peeling-off or the wear. Further, because a small surface area of a diamond film can be applied by the method, expensive manufacturing equipment is needless even in the case of producing a large electrode. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006299392(A) 申请公布日期 2006.11.02
申请号 JP20050145991 申请日期 2005.04.15
申请人 EBARA CORP 发明人 FUJIMURA HIROYUKI;ITO KANICHI;SERIKAWA ROBERUTO MASAHIRO
分类号 C25B11/12;C02F1/46;C23C16/01 主分类号 C25B11/12
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