| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetic layer processing process for simply performing a microfabrication without damaging a magnetic material in a magnetic material processing accompanying a pattern transfer by means of imprint. SOLUTION: A SOG (Spin on Glass) 201 composed of one material selected from silica glass, alkyl siloxane polymer, alkyl silsesqui oxysan polymer (MSQ), hydrogenation silsesqui oxysan polymer (HSQ), hydrogenation alkyl siloxane polymer (HOSP) is provided at protrusions of a magnetic layer 103, the SOG 201 is transformed to a SiO<SB>2</SB>102 by performing an ion milling, thereby being functioned as an etching mask of the magnetic layer 103. COPYRIGHT: (C)2007,JPO&INPIT
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