发明名称 Quantum dot resonant tunneling device
摘要 A quantum-dot resonant-tunneling device apparatus is provided. The quantum-dot resonant-tunneling device apparatus includes a pair of top-and-down N-type electron injection layers and a pair of quantum-dot layers sandwiched with at least a period of double-barrier. The pair of top-and-down N-type electron injection layers is provided with an adequate positive or negative electric field which leads to electronic resonant-tunneling transportation in the quantum-dot layers mentioned above. In addition, once the electrons are tunneling transported in the device, the device serves as a negative resistance device. The device does not only provide bipolar negative resistance capability and a superior temperature stability within a very wide temperature range, but also operates well under room temperature.
申请公布号 US2006243962(A1) 申请公布日期 2006.11.02
申请号 US20050282757 申请日期 2005.11.17
申请人 TANG SHIANG-FENG;CHIANG CHENG-DER;YANG SAN-TE;RUO JIUNN-JYE;YEN SHUN-LUNG 发明人 TANG SHIANG-FENG;CHIANG CHENG-DER;YANG SAN-TE;RUO JIUNN-JYE;YEN SHUN-LUNG
分类号 H01L29/06 主分类号 H01L29/06
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