发明名称 APPARATUS AND METHOD FOR CLEANING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a cleaning apparatus and a cleaning method capable of suppressing the variation in ozone concentration upon cleaning and reducing the waste of pure water. SOLUTION: The cleaning apparatus 100 comprises a rotary table 13T as a supporting section for supporting a substrate W, an ozone ice forming device 23 as an ozone ice forming section for freezing ozone water into ozone ice, an ozone ice melting device 24 as an ozone ice melting section for melting the ozone ice into ozone liquid, and a delivery nozzle 27 as a delivery section for delivering the ozone liquid to the substrate W supported by the rotary table 13T. The cleaning apparatus 100 forms the ozone liquid while melting the ozone ice, and delivers the ozone liquid having uniform ozone concentration to the substrate W and cleans it by the strong oxidizing/decomposing action of ozone. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006303143(A) 申请公布日期 2006.11.02
申请号 JP20050121996 申请日期 2005.04.20
申请人 SEIKO EPSON CORP 发明人 AOKI KOJI;MORI YOSHIAKI
分类号 H01L21/304;B08B3/02;H01L21/027 主分类号 H01L21/304
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