| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a magnetic metal film for which a polishing speed by high CMP can be maintained, a level difference between an insulating material film and a magnetic metal film is small, and CMP processing can be applied without causing defective such as a scratch on the magnetic metal film; and to provide a polishing material for an insulating material film composite material. <P>SOLUTION: The magnetic metal film and the polishing material for an insulating material film composite material contain water, abrasive grains, amino acid and inorganic acid. In this film, pH is 1.5-4 and neutralization titration equivalence by potassium hydroxide is not less than 0.05 mol/kg. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
