Narrow write head pole tip fabricated by sidewall processing

摘要

The magnetic head includes a P 2 pole tip in which the P 2 pole tip material is electroplated upon a sidewall of the P 2 pole tip photolithographic trench. To accomplish this, a block of material is deposited upon a write gap layer, such that a generally straight, vertical sidewall of the block of material is disposed at the P 2 pole tip location. Thereafter, an electroplating seed layer is deposited upon the sidewall. A P 2 pole tip trench is photolithographically fabricated such that the sidewall (with its deposited seed layer) is exposed within the P 2 pole tip trench. Thereafter, the P 2 pole tip is formed by electroplating pole tip material upon the seed layer and outward from the sidewall within the trench. The width of the P 2 pole tip is thus determined by the quantity of pole tip material that is deposited upon the sidewall.