| 摘要 |
A method for reducing outgassing pollution in a semiconductor process includes matching a pressure of a VCE with a pressure of a process chamber before reaction gas is injected into the process chamber, injecting the reaction gas into the process chamber, opening a partitioning door disposed between the VCE and the process chamber, and extracting from the VCE gas formed by a reaction between residual reaction gas on a wafer surface and gas in the VCE through an exhaust of the VCE.
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