| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask-retaining backup mechanism in an exposure device, capable of preventing mask drops, that will not interfere with a work, even when a work larger than a mask is brought close to the mask, and reliably preventing a mask from dropping, even if the absorption power of the mask to a mask retaining body is lost. <P>SOLUTION: The mechanism comprises at least one set of a mask drop prevention means 103, disposed at an facing position via the mask 102 of a mask-retaining body 101. The mask drop prevention means 103 has a mask-receiving part 104a, facing an engaging part 102a in the outer perimeter edge of the mask 102 at its front edge, and comprises a mask support body 104, disposed so that its lower surface is not positioned below the lowermost surface of the mask 102, and a drive mechanism 105 for driving the mask support body 104 so that its mask-receiving part 104a can be brought close to and separated from the engaging part 102a. <P>COPYRIGHT: (C)2007,JPO&INPIT |
