| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for depositing a film with high yield, and to provide a method for processing a substrate. SOLUTION: The method for depositing a film 8 by coating a substrate 7 with a fluid film deposition material comprises a step for coating the substrate 7 with a film deposition material, a heat treatment step for obtaining a film 8 by heating and drying the film deposition material, and a step for detecting stress of the film 8 and reheating at least a part of the film 8 based on the detected stress to adjust the stress uniformly. COPYRIGHT: (C)2007,JPO&INPIT
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