DEVICE FOR COATING THE OUTER EDGE OF A SUBSTRATE DURING MICROELECTRONICS MANUFACTURING
摘要
New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface (38), a curved sidewall (42) coupled to the vertical surface, and a lip (40) coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.
申请公布号
WO2006071363(A3)
申请公布日期
2006.10.26
申请号
WO2005US40433
申请日期
2005.11.07
申请人
BREWER SCIENCE INC.;BRAND, GARY, J.;ALLEN, PHILLIP, H.;TRICHUR, RAMACHANDRAN, K.
发明人
BRAND, GARY, J.;ALLEN, PHILLIP, H.;TRICHUR, RAMACHANDRAN, K.