CONVEY ERROR MEASURING METHOD, CALIBRATION METHOD, PLOTTING METHOD, EXPOSURE PLOTTING METHOD, PLOTTING DEVICE, AND EXPOSURE PLOTTING DEVICE

摘要

A plotting device includes: a first convey unit (100) for conveying a measurement work (36a) relatively to exposure heads (24a to 24h); a first plotting unit (102) for successively plotting a test pattern image (112) on the measurement work (36a) by the exposure heads (24a to 24h); a measurement unit (104) for measuring at least a relative convey error of the measurement work (36a) according to the plotting state of the test pattern images (112) plotted on the measurement work (36a); a correction unit (106) for creating information on the plotting timing and the image deformation according to the convey error; a second convey unit (108) for conveying a normal work (36) relatively to the exposure heads (24a to 24h); and a second plotting unit (110) for plotting the image to be plotted on the normal work (36) according to the information created by the correction unit (106).