发明名称 |
SUBSTRATE PROCESSING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide substrate processing equipment which easily performs a wet cleaning of treatment pipe. SOLUTION: The equipment comprises: a heating means 207 for heating a substrate 200; a treatment pipe 203, in which a cross-section is profiled in roughly circle for housing the above-mentioned substrate; at least one of capillaries 232a, 232b, 275 prepared in the treatment pipe with ends projecting outside from the outer wall of the treatment pipe; a processing gas supplying system 230 supplying a processing gas inside the above-mentioned treatment pipe through at least one of the capillaries; and an exhaust system 240 exhausting an inside of the above-mentioned treatment pipe through an exhaust port 231 prepared in the above-mentioned treatment pipe. The above-mentioned capillaries and exhaust port are arranged within roughly 180°in a circumference direction of the above-mentioned treatment pipe. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2006295032(A) |
申请公布日期 |
2006.10.26 |
申请号 |
JP20050116726 |
申请日期 |
2005.04.14 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
SHIMA NOBUHITO;YAMAMOTO TETSUO;KONYA TADASHI |
分类号 |
H01L21/31;C23C16/44;H01L21/22;H01L21/324 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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