| 发明名称 |
Polymer remover |
| 摘要 |
Compositions useful for the removal of post-plasma processing polymeric residue from substrates, such as electronic devices, are provided. Also provided are methods of removing the post-plasma processing residues and methods of manufacturing integrated circuits using the compositions.
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| 申请公布号 |
US2006237392(A1) |
申请公布日期 |
2006.10.26 |
| 申请号 |
US20060374245 |
申请日期 |
2006.03.13 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
AUGER ROBERT L.;LACHOWSKI JOSEPH F. |
| 分类号 |
C09K13/00;B44C1/22;H01L21/302 |
主分类号 |
C09K13/00 |
| 代理机构 |
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